Preparation of nearly oxygen-free AlN thin films by pulsed laser deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 4, 1998, Pages 2372-2375

  He, Maoqi ^a,b   Cheng, Naiqun ^a   Zhou, Peizhen ^a   Okabe, Hideo ^a,b   Halpern, Joshua B ^a,b  

^a HOWARD UNIVERSITY   (United States)

^b Department of Chemistry ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032330539     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581354     Document Type: Article

References (24)

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