RF-sputtering deposition of Al/Al2O3 multilayers

Thin Solid Films

Volumn 336, Issue 1-2, 1998, Pages 373-376

  Paven Thivet, Le ^a   Malibert, C ^a   Houdy, Ph ^a   Albouy, P A ^b  

^a UNIVERSITÉ D EVRY VAL D ESSONNE   (France)

^b UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

Al Al2O3 multilayers; RF sputtering; Scanning electronic microscopy; X ray diffraction

Indexed keywords

ALUMINA; ALUMINUM; AMORPHOUS FILMS; DIFFUSION IN SOLIDS; GRAIN SIZE AND SHAPE; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; SUBSTRATES; SURFACE ROUGHNESS; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

NANOSCALE LAMINATED MATERIALS;

MULTILAYERS;

EID: 0032320726     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01288-7     Document Type: Article

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