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Thin Solid Films

Volumn 335, Issue 1-2, 1998, Pages 85-89

Characterization of epitaxially grown Cu/Nb multilayer on α-Al2O3 with RBS/channeling technique

(5) Yamamoto, S a Naramoto, H a Tuchiya, B a Narumi, K a Aoki, Y a

a JAPAN ATOMIC ENERGY AGENCY (Japan)

Author keywords

Copper; Epitaxy; Multilayer; Niobium; Rutherford backscattering spectroscopy

Indexed keywords

ALUMINA; COPPER; EPITAXIAL GROWTH; EVAPORATION; FILM GROWTH; INTERFACES (MATERIALS); MULTILAYERS; NIOBIUM; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SINGLE CRYSTALS; SUBSTRATES; X RAY CRYSTALLOGRAPHY;

ELECTRON BEAM EVAPORATION; HETEROEPITAXIAL GROWTH; INTERFACE BOUNDARY;

THIN FILMS;

EID: 0032320113 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(98)00948-1 Document Type: Article

Times cited : (9)

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