Thin ORMOSIL Films with Different Organics

Journal of Sol-Gel Science and Technology

Volumn 13, Issue 1-3, 1998, Pages 467-472

  Vorotilov, K A ^a   Vasiljev, V A ^a   Sobolevsky, M V ^a   Sigov, A S ^a  

^a Moscow State Institute of Radioenginering Electronics and Automation   (Russian Federation)

Author keywords

Electrical properties; Organically modified silicates; Structural properties; Thin films

Indexed keywords

ANNEALING; CHEMICAL BONDS; GELATION; HEAT TREATMENT; HYDROLYSIS; POLYCONDENSATION; REFRACTIVE INDEX; SOL-GELS; THIN FILMS; ULSI CIRCUITS; VLSI CIRCUITS; ELLIPSOMETRY; INFRARED SPECTROSCOPY; MOLECULAR STRUCTURE; PERMITTIVITY; SHRINKAGE; SILANES; THERMAL EFFECTS;

FILM STRUCTURE; MOLAR RATIO; ORGANICALLY MODIFIED SILICATES (ORMOSIL); STRUCTURAL PROPERTIES; TETRAETHOXYSILANE; THERMODESTRUCTION;

SILICATES;

EID: 0032319681     PISSN: 09280707     EISSN: None     Source Type: Journal    
DOI: 10.1023/a:1008637715468     Document Type: Article

References (7)

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