Structure, properties and applications of phenyl-modified silicate films

Thin Solid Films

Volumn 288, Issue 1-2, 1996, Pages 57-63

  Vorotilov, Konstantin A ^a   Vasiljev, Vladimir A ^a   Sobolevsky, Michael V ^a   Afanasyeva, Natalia I ^b  

^a MIREA RUSSIAN TECHNOLOGICAL UNIVERSITY   (Russian Federation)

^b INSTITUTE OF SPECTROSCOPY   (Russian Federation)

Author keywords

Electrical properties and measurements; Metallization; Optical properties; Planarization; Structural properties

Indexed keywords

DENSITY (SPECIFIC GRAVITY); FILM GROWTH; FILM PREPARATION; HYDROLYSIS; METALLIZING; PERMITTIVITY; SHRINKAGE; SOL-GELS; THERMODYNAMIC STABILITY;

COHYDROLYSIS; CRACKING RESISTANCE; DIPHENYL DIETHYLHEXYLOXY DIETHOXYDISILOXANE (DPS); METALLIZATION; ORGANICALLY MODIFIED SILICATE FILMS (ORMOSILS); PHENYL MODIFIED SILICATE FILMS; PHENYL RADICALS; PHENYL TRIEHOXYSILANE (PTEOS); PLANARIZATION; TETRAETHYLOXYSILANE (TEOS);

SILICATES;

EID: 0030284807     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)08863-3     Document Type: Article

References (15)

1. H. Schmidt, J. Non-Cryst. Solids, 73 (1985) 681.
2. C.J. Brinker and G.W. Scherer, Sol-Gel Science: The Physics and Chemistry of Sol-Gel Processing, Academic Press, San Diego, CA, 1990.
3. J.D. Mackenzie, J. Sol-Gel Sci. Technol., 2 (1994) 81.
4. A. Lee Smith, Applied Infrared Spectroscopy, Wiley, New York, 1979.
5. L.J. Bellamy, The Infra-Red Spectra of Complex Molecules, Methuen, London, Wiley, New York, 1954.
6. K. Nakanishi, Infrared Absorption Spectroscopy, Holden-Day, Inc., San Francisco, CA, Nankodo Company Ltd, Tokyo, 1962.
7. R. Sokoll, H.-J. Tiller and T. Hoyer, J. Electrochem. Soc., 238 (1991) 2150.
8. V.K. Grigor'ev, V.I. Petrovsky and I.A. Shapova, Izmeritelnaja Techn., 1 (1991) 15 (in Russian).
9. K. Vorotilov, V. Petrovsky and V. Vasiljev, J. Sol-Gel Sci. Technol., 5 (1995) 173.
10. T. Nakano, K. Tokunaga and T. Ohta, PLANAR 94, June 6, 1994, Sunnyvale, p. 11.
11. K.A. Vorotilov, E.V. Orlova and V.I. Petrovsky, Thin Solid Films, 209 (1992) 188.
12. Y.W. Lam and H.C. Lam, J. Phys. D., 9 (1976) 1477.
13. H.C. Lam and Y.W. Lam, Thin Solid Films, 41 (1977) 43.
14. S.M. Sze, Physics of Semiconductor Devices, Wiley, New York, 1981.
15. Y. Shacham-Diamand and Y. Nachumovsky, J. Electrochem. Soc., 137 (1990) 190.