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Solid State Communications

Volumn 109, Issue 3, 1998, Pages 195-199

Chemical etching of porous silicon in diluted hydrofluoric acid

(3) Tsuboi, Takashi a Sakka, Tetsuo a Ogata, Yukio H a

a KYOTO UNIVERSITY (Japan)

Author keywords

A. Nanostructures; A. Semiconductors; A. Surfaces and interfaces

Indexed keywords

CRYSTAL ORIENTATION; DISSOLUTION; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROFLUORIC ACID; HYDROGEN BONDS; INTERFACES (MATERIALS); MOLECULAR STRUCTURE; MORPHOLOGY; NANOSTRUCTURED MATERIALS; POROUS SILICON; SURFACE STRUCTURE;

MICROFACETS;

SEMICONDUCTING SILICON;

EID: 0032311933 PISSN: 00381098 EISSN: None Source Type: Journal
DOI: 10.1016/S0038-1098(98)00508-0 Document Type: Article

Times cited : (25)

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