XPS studies of low-temperature plasma-produced graded oxide-silicate-silica layers on titanium

Surface and Interface Analysis

Volumn 26, Issue 13, 1998, Pages 1027-1034

  Steveson, Michael ^a   Arora, Pawittar S ^a   Smart, Roger St C ^a  

^a UNIVERSITY OF SOUTH AUSTRALIA   (Australia)

Author keywords

Auger parameter; Depth profiling; SiO2; Ti; x ray photoelectron spectroscopy; XPS

Indexed keywords

AUGER PARAMETERS; DEPTH PROFILING;

DEPOSITION; INTERFACES (MATERIALS); PLASMA APPLICATIONS; SCANNING ELECTRON MICROSCOPY; SILICA; SILICATES; SUBSTRATES; SURFACE STRUCTURE; TITANIUM; X RAY PHOTOELECTRON SPECTROSCOPY;

COATINGS;

EID: 0032299240     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199812)26:13<1027::AID-SIA452>3.0.CO;2-9     Document Type: Article

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