Formation of silicate structures in oxidized nickel surfaces using low-temperature plasma reaction

Surface and Interface Analysis

Volumn 24, Issue 9, 1996, Pages 539-548

  Arora, Pawittar S ^a   Smart, Roger St C ^a  

^a UNIVERSITY OF SOUTH AUSTRALIA   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

LOW TEMPERATURE PLASMA REACTION; SILICATE STRUCTURES; TETRAETHYLORTHOSILICATE;

DISSOLUTION; INTERFACES (MATERIALS); LOW TEMPERATURE EFFECTS; MASS SPECTROMETRY; MIXTURES; NICKEL; OXIDES; PH; PLASMA APPLICATIONS; SILICA; SILICATES; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACE STRUCTURE;

EID: 0030247894     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(19960916)24:9<539::AID-SIA162>3.0.CO;2-5     Document Type: Article

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