Photolithography at wavelengths below 200 nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3274, Issue , 1998, Pages 222-228

  Rothschild, M ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIREFRINGENCE; DYNAMIC RANDOM ACCESS STORAGE; MICROPROCESSOR CHIPS; OPTICAL COATINGS; OPTICAL MATERIALS;

PROJECTION PHOTOLITHOGRAPHY;

PHOTORESISTS;

EID: 0032225863     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.309515     Document Type: Conference Paper

References (8)