Kinetics of thin-film reactions of nickel oxide with alumina: II, {1100} and {1102} reaction couples

Journal of the American Ceramic Society

Volumn 81, Issue 11, 1998, Pages 2877-2884

  Kotula, Paul G ^a,b,c   Carter, C Barry ^a,b  

^a University of Minnesota   (United States)

^b AMERICAN CERAMIC SOCIETY   (United States)

^c LOS ALAMOS NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ALUMINA; CRYSTAL GROWTH; CRYSTAL ORIENTATION; DEPOSITION; DIFFUSION IN SOLIDS; FILM GROWTH; PULSED LASER APPLICATIONS; REACTION KINETICS; THIN FILMS;

NICKEL ALUMINATE; NICKEL OXIDES; PULSED-LASER DEPOSITION; SOLID-STATE REACTIONS;

NICKEL COMPOUNDS;

EID: 0032208598     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.1998.tb02709.x     Document Type: Article

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