A vapor phase clean to remove sodium using 1,1,1,5,5,5-hexafluoro-2,4-pentanedione

Electrochemical and Solid-State Letters

Volumn 1, Issue 5, 1998, Pages 235-237

  Beck, S E ^a,f   Robertson III, E A ^a   George, M A ^a,b,f   Bohling, D A ^a,c,f   Moniot, D A ^a   Waskiewicz, J L ^a,d   Young, K M ^a,e  

^a AIR PRODUCTS AND CHEMICALS INC   (United States)

^b Deposition Sciences Inc   (United States)

^c Sola Optical USA   (United States)

^d UNIVERSITY OF WASHINGTON   (United States)

^e The University of North Carolina at Chapel Hill   (United States)

^f ELECTROCHEMICAL SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHELATION; CHEMICAL CLEANING; SODIUM;

VAPOR PHASE METHODS;

SILICON WAFERS;

EID: 0032206490     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1390697     Document Type: Article

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