Magnetically enhanced dual frequency capacitively coupled plasma source for large-area wafer processing

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 11, 1998, Pages 6193-6198

  Wickramanayaka, Sunil ^a   Nakagawa, Yukito ^a  

^a Head Office ^*  (Japan)

Author keywords

High density plasma; Large area plasma; Magnetic field cusps; Magnetic field free process environment; Magnetron type plasma; Plasma uniformity

Indexed keywords

CHARGED PARTICLES; ELECTRODES; MAGNETIC FIELDS; MAGNETRONS; MAGNETS; PLASMA DENSITY; SEMICONDUCTOR DEVICE MANUFACTURE;

LARGE-AREA WAFER PROCESSING;

PLASMA SOURCES;

EID: 0032205888     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.6193     Document Type: Article

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