Structure and morphology of Ni monolayers on W(110)

Surface Science

Volumn 417, Issue 2-3, 1998, Pages 361-371

  Schmidthals, C ^a   Sander, D ^a   Enders, A ^a   Kirschner, J ^a  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

Author keywords

Morphology; Nickel; Scanning Tunneling Microscopy (STM); Structure; Tungsten

Indexed keywords

ANISOTROPY; DIFFUSION; FILM GROWTH; IMAGE ANALYSIS; LOW ENERGY ELECTRON DIFFRACTION; MONOLAYERS; MORPHOLOGY; SCANNING TUNNELING MICROSCOPY; STRAIN; SURFACE STRUCTURE; THREE DIMENSIONAL; TUNGSTEN;

ANISOTROPIC DIFFUSION; ANISOTROPIC STRAIN; ATOMIC LAYER; LAYER BY LAYER GROWTH; THREE DIMENSIONAL GROWTH;

NICKEL;

EID: 0032205152     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(98)00689-X     Document Type: Article

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