Patterning of Langmuir-Blodgett film with ultrahigh vacuum-scanning tunneling microscope/atomic force microscope

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 4, 1997, Pages 1414-1418

  Hamanaka, H ^a   Ono, T ^a   Esashi, M ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 5844315288     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589463     Document Type: Article

References (10)

1. J. W. Lyding, G. C. Abeln, and T. C. Shen, J. Vac. Sci. Technol. B 12, 3735 (1994).
2. H. Sugimura and N. Nakagiri, Jpn. J. Appl. Phys. 32, 3406 (1995).
3. H. Sugimura and N. Nakagiri, Appl. Phys. Lett. 66, 1430 (1995).
4. T. Ono, H. Hamanaka, and M. Esashi, Thin Solid Films (to be published).
5. W. Langheinrich and H. Beneking, Nanolithography: A Borderland Between STM, EB, IB, and X-Ray Lithographies (Kluwer, Dordrecht, 1994), pp. 53-56.
6. W. J. Dressick and J. M. Calvert, Jpn. J. Appl. Phys. 32, 5829 (1993).
7. A. Barraud, C. Rosilio, and A. Ruaudel-Teixier, Solid State Technol. 120 (1979).
8. L. Stockman, G. Neuttiens, and C. Van Haensendonck, Appl. Phys. Lett. 62, 2935 (1993).
9. D. J. Ehrlich and J. Melngailis, Appl. Phys. Lett. 58, 2675 (1991).
10. N. Awaya and Y. Arita, Jpn. J. Appl. Phys. 27, 1172 (1988).