Microstructuring of Molecularly Thin Polymer Layers by Photolithography

Advanced Materials

Volumn 10, Issue 14, 1998, Pages 1073-1077

  Prucker, Oswald ^b   Schimmel, Martin ^a   Tovar, Günter ^c   Knoll, Wolfgang ^a   Rühe, Jürgen ^a  

^a MAX PLANCK INSTITUTE FOR POLYMER RESEARCH   (Germany)

^b Stanford University   (United States)

^c FRAUNHOFER INSTITUTE FOR INTERFACIAL ENGINEERING AND BIOTECHNOLOGY IGB   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; CHEMICAL BONDS; INITIATORS (CHEMICAL); MICROSTRUCTURE; MOLECULAR STRUCTURE; PHOTOLITHOGRAPHY; PHOTOPOLYMERIZATION; POLYMETHYL METHACRYLATES; POLYSTYRENES; SURFACE PROPERTIES; SURFACE TREATMENT; ULTRATHIN FILMS;

PHOTOINITIATORS;

PLASTIC FILMS;

EID: 0032182823     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-4095(199810)10:14<1073::AID-ADMA1073>3.0.CO;2-D     Document Type: Article

References (33)

1. C. G. Willson, in Introduction to Microlithography, 2nd ed. (Eds: L. F. Thompson, C. G. Willson, M. J. Bowden), ACS, Washington, DC 1994, p. 139.
2. a) G. G. Roberts, Langmuir-Blodgett Films, Plenum, New York 1990.
3. b) K. Mathauer, F. Embs, G. Wegner, in Comprehensive Polymer Science (Ed: G. Allen), Pergamon, Oxford 1992, 1st Suppl., p. 449.
4. a) A. Ulmann, An Introduction to Ultrathin Organic Films, Academic, San Diego, CA 1991.
5. b) G. M. Whitesides, J. P. Mathias, C. T. Seto, Science 1991, 254, 1312.
6. Y. Xia, G. M. Whitesides, Angew. Chem. Int. Ed. 1998, 37, 550.
7. G. Decher, J.-D. Hong, Macromol. Chem., Macromol. Symp. 1991, 46, 321.
8. a) S. L. Clark, M. F. Montague, P. T. Hammond, Supramol. Sci. 1997, 4, 141.
9. b) S. L. Clark, M. F. Montague, P. T. Hammond, Macromolecules 1997, 30, 7237.
10. A. Ulman, Chem. Rev. 1990, 96, 1533.
11. a) J. Rühe, Nachr. Chem. Tech. Lab. 1994, 42, 1237.
12. b) O. Prucker, J. Rühe, Macromolecules 1998, 31, 592.
13. O. Prucker, J. Rühe, Macromolecules 1998, 31, 602.
14. a) K. P. Krenkler, R. Laible, K. Hamann, Angew. Makromol. Chem. 1978, 53, 101.
15. b) N. Tsubokawa, M. Hosoya, K. Yanadori, Y. Sone, J. Macromol. Sci, Chem. 1990, A27, 445.
16. W. Wang, D. G. Castner, D. W. Grainger, Supramol. Sci. 1997, 4, 83.
17. P. S. Engel, Chem. Rev. 1980, 80, 99.
18. a) M. K. Mishra, J. Macromol. Sci., Rev. Macromol. Chem. Phys. 1983, C22, 409.
19. b) F. de Schrijver, G. Smets, J. Polym. Sci. 1966, 4, 2201.
20. P. Smith, A. M. Rosenberg, J. Am. Chem. Soc. 1959, 81, 2037.
21. 2] at the location of the sample was determined photometrically using a UV photometer from VSI Kettering (Germany).
22. A direct comparison of the kinetics of photopolymerization at surfaces with the decomposition behavior of 2,2′-azobisisobutyronitrile (AIBN) in a solution polymerization is possible only to a certain extent, as geometrical and topological factors such as the orientation of the azo molecules at the surface can change both the molar extinction coefficient and the quantum yield (i.e., the number of radical chains started versus the number of absorbed photons); see for example [5].
23. W. Knoll, MRS Bull. 1991, 16, 29.
24. a) B. Rothenhäusler, W. Knoll, Nature 1988, 332, 615.
25. b) J. Opt. Soc. Am. B. 1988, 5, 1401.
26. The distortion of the quadratic geometry of the pattern is due to the angle between the sample plane and the image plane.
27. It should be noted that the periodic intensity oscillations, which can be seen in the bright areas of both micrographs, are not due to inhomogeneities, but caused by a well-understood interference phenomenon between the incident light and the surface evanescent waves.
28. a) A. Offenhäusser, J. Ruhe, W. Knoll, J. Vac. Sci. Technol. A 1995, 13, 2606.
29. W. Knoll, M. Mazsuzawa, A. Offenhäusser, J. Rühe, Isr. J. Chem. 1996, 36, 357.
30. J. Rühe, R. Yano, J. S. Lee, P. Köberle, W. Knoll, A. Offenhäusser, unpublished.
31. C. Spröβler, M. Schimmel, W. Knoll, J. Rühe, A. Offenhäusser, in preparation.
32. G. Tovar, S. Paul, W. Knoll, O. Prucker, J. Rühe, Supramol. Sci. 1995, 2, 89.
33. E. Kretschmann, Opt. Commun. 1972, 6, 185.