Dilute RCA cleaning chemistries

Semiconductor International

Volumn 21, Issue 11, 1998, Pages 95-100

  Couteau, Terri ^a   McBride, Michael ^a   Riley, Deborah ^a   Peavey, Paula ^b  

^a ADVANCED MICRO DEVICES   (United States)

^b TOKYO ELECTRON AMERICA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL CLEANING; COST EFFECTIVENESS; CRYSTAL DEFECTS; HYDROCHLORIC ACID; HYDROGEN PEROXIDE; OXIDATION; OXIDES; PERFORMANCE; SEMICONDUCTOR DEVICE TESTING;

BATH CONTROL; CHEMICAL USAGE; CLEANING CHEMISTRIES; DEFECT DENSITY; GATE OXIDE INTEGRITY; OXIDE LOSS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032181277     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (5)

1. T. Q. Hurd, SEMI 1995 - Cleaning Technology for the Sub mm Era, p. 69, 1995.
2. T. Q. Hurd, P. W. Mertens, H. F. Schmidt, D. Ditter, L. H. Hall, M. Meuris, M. M. Heyns, 1994 Proceedings of the Institute of Environmental Sciences, p. 145, 1994.
3. T. Q. Hurd, P. W. Mertens, L. H. Hall, M. M. Heyns, UCPSS 1994 Proceedings, p. 435, 1994.
4. W. A. Kern and D. A. Poutinen, RCA Rev., p. 187, 1970.
5. D. J. Riley, J. S. Click, V. Parks, G. Matamis, The Impact of Temperature and Concentration on SC-2 Cost and Performance in a Production Environment, MRS Symposium Proceedings, Vol. 477, p. 519, 1997, editors M. Hirose, S. Raghavan, S. Verhaverbeki.