Perturbation method for dielectric constant measurement of thick-film dielectric materials at microwave frequencies

Electronics Letters

Volumn 34, Issue 21, 1998, Pages 2042-2044

  Li, D ^a   Free, C E ^a   Pitt, K E G ^a   Barnwell, P G ^b  

^a MIDDLESEX UNIVERSITY   (United Kingdom)

^b Heraeus Incorporated Arizona   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CAVITY RESONATORS; ELECTRIC FIELD EFFECTS; FREQUENCIES; PERMITTIVITY MEASUREMENT; PERTURBATION TECHNIQUES; THICK FILMS;

CAVITY PERTURBATION METHOD; MICROWAVE FREQUENCIES;

DIELECTRIC FILMS;

EID: 0032179615     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:19981392     Document Type: Article

References (5)

1. SUCHER, M., and FOX, J.: 'Handbook of microwave measurements' (Polytechnic Press of the Polytechnic Institute of Brooklyn, 1963), Vol. II
2. HUANG, H., FREE, C.E., PITT, K.E.G., BERZINS, A.R., and SHORTHOUSE, G.P.: 'Relative permittivity measurement of thick-film dielectrics at microwave frequencies', Electron. Lett., 1995, 31, (21), pp. 1812-1814
3. JANEZIC, M.D., and GROSVENOR, J.H.: 'Improved technique for measuring permittivity of thin dielectrics with a cylindrical resonant cavity'. IEEE Int. Conf. Instrument and Measurement, 1991, pp. 580-584
4. AMEY, D.I., and HOROWITZ, S.J.: 'Microwave material characterisation'. ISHM'96 Proc., Minneapolis, October 1996, pp. 494-499
5. BARNWELL, P., and WOOD. J.: 'Advanced thick film technology-the new generation'. Proc. 11th European Microelectronics Conf., Venice, May 1997, pp. 51-53