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Japanese Journal of Applied Physics, Part 2: Letters

Volumn 37, Issue 10 PART A, 1998, Pages

Nitridation of silicon oxide surfaces by fluorination and subsequent exposure to atomic nitrogen

(2) Saito, Yoji a Mori, Ukyo a

a SEIKEI UNIVERSITY (Japan)

Author keywords

AFM; Fluorine; Nitridation; Nitrogen; Remote plasma; Silicon dioxide; XPS

Indexed keywords

ATOMIC FORCE MICROSCOPY; BORON; DIELECTRIC FILMS; FLUORINE; MOSFET DEVICES; NITRIDING; NITROGEN; PLASMA APPLICATIONS; SURFACE ROUGHNESS; SURFACE TREATMENT; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC NITROGEN; FLUORINATION; ULTRATHIN DIELECTRICS;

SILICA;

EID: 0032178558 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.37.l1172 Document Type: Article

Times cited : (8)

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