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Volumn 154, Issue 5-6, 1998, Pages 359-367
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Apodized annular-aperture diffractive axicons fabricated by continuous-path-control electron beam lithography
a b c c c d |
Author keywords
Axicon; Diffraction; Electron beam lithography
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Indexed keywords
ELECTROMAGNETIC WAVE DIFFRACTION;
ELECTRON BEAM LITHOGRAPHY;
ERROR ANALYSIS;
LIGHT INTERFERENCE;
OPTICAL DESIGN;
APODIZATION METHOD;
BINARY DIFFRACTIVE AXICONS;
CONTINUOUS-PATH-CONTROL MODE;
DYNAMIC BEAM EXPANSION;
DIFFRACTION GRATINGS;
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EID: 0032167285
PISSN: 00304018
EISSN: None
Source Type: Journal
DOI: 10.1016/S0030-4018(98)00289-2 Document Type: Article |
Times cited : (31)
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References (30)
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