TEM study of tantalum clusters on Al2O3/NiAl(110)

Surface Science

Volumn 412-413, Issue , 1998, Pages 192-201

  Nepijko, S A ^a   Klimenkov, M ^a   Kuhlenbeck, H ^a   Zemlyanov, D ^a   Herein, D ^a   Schlogl R ^a   Freund, H J ^a  

^a FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

Author keywords

Aluminum oxide; Cluster; Energy dispersive X ray analysis; Tantalum; Thin films; Transmission electron microscopy; X ray photoelectron spectroscopy

Indexed keywords

ALUMINA; DEPOSITION; EPITAXIAL GROWTH; LATTICE CONSTANTS; NICKEL COMPOUNDS; OXIDATION; SURFACE PHENOMENA; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ENERGY DISPERSIVE X-RAY ANALYSIS; NICKEL ALUMINIDE;

TANTALUM;

EID: 0032166664     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(98)00387-2     Document Type: Article

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