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Volumn 7, Issue 9, 1998, Pages 1364-1374

Atomic carbon insertion as a low-substrate-temperature growth mechanism in diamond CVD

Author keywords

Atomic carbon insertion; Diamond CVD; Substrate temperature

Indexed keywords

CARBON; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; FILM GROWTH; FREE RADICALS;

EID: 0032163582     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(98)00208-8     Document Type: Article
Times cited : (11)

References (48)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.