From mesoscopic to nanoscopic surface structures: Lithography with colloid monolayers

Chemical Engineering and Technology

Volumn 21, Issue 9, 1998, Pages 761-763

  Burmeister, Frank ^a   Schäfle, Claudia ^a   Keilhofer, Bettina ^a   Bechinger, Clemens ^a   Boneberg, Johannes ^a   Leiderer, Paul ^a  

^a UNIVERSITY OF KONSTANZ   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032162444     PISSN: 09307516     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-4125(199809)21:9<761::AID-CEAT761>3.0.CO;2-Y     Document Type: Article

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