Numerical scale-up study of silicon deposition using 2D slit nozzle sources

Materials Science in Semiconductor Processing

Volumn 1, Issue 2, 1998, Pages 141-152

  Ghen, C ^a   Boyd, I D ^a  

^a Cornell University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DEPOSITION; FILM GROWTH; KINETIC ENERGY; MOLECULAR BEAMS; MONTE CARLO METHODS; NOZZLES; SEMICONDUCTING SILICON; SUPERSONIC FLOW;

SUPERSONIC MOLECULAR BEAMS; TWO DIMENSIONAL SLIT NOZZLE SOURCES;

SEMICONDUCTING FILMS;

EID: 0032157518     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(98)00018-3     Document Type: Article

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