Cross sections for electron-impact dissociation of alternative etching gas, C3HF7O

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 9 A, 1998, Pages 5053-5059

  Tanaka, Hideyuki ^a   Toyoda, Hirotaka ^a   Sugai, Hideo ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

1,2,2,2 tetrafluoroethyl trifluoromethyl ether; Dissociation cross section; Dissociative ionization cross section; Electron impact; Neutral radical

Indexed keywords

DISSOCIATION; ELECTRON ENERGY LEVELS; ELECTRON TRANSPORT PROPERTIES; ETCHING; IONIZATION; MASS SPECTROMETRY;

ELECTRON IMPACT DISSOCIATION; ETCHING GAS; NEUTRAL RADICAL; TETRAFLUOROETHYLENE TRIFLUOROMETHYL ETHER;

ETHERS;

EID: 0032154617     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.5053     Document Type: Article

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