Fine-tuned profile simulation of holographically exposed photoresist gratings

Optics Communications

Volumn 154, Issue 1-3, 1998, Pages 109-118

  Zanke, Ch ^a   Gombert, A ^a   Erdmann, A ^b   Weiss, M ^b  

^a FRAUNHOFER INSTITUTE FOR SOLAR ENERGY SYSTEMS ISE   (Germany)

^b FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

Author keywords

Grating; Holography; Photoresist; Simulation

Indexed keywords

DIFFRACTION GRATINGS; OPTICS; OPTOELECTRONIC DEVICES; PHOTORESISTS; SIMULATION; SPECTROSCOPY;

HOLOGRAPHICALLY EXPOSED PHOTORESIST GRATINGS; INHIBITOR CONCENTRATION;

HOLOGRAPHY;

EID: 0032140096     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0030-4018(98)00252-1     Document Type: Article

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