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Applied Physics A: Materials Science and Processing

Volumn 67, Issue 2, 1998, Pages 139-145

Raman investigation of submicro-grained Si films obtained by incoherent UV photo-CVD of silicon hydrides

(4) Prevot, B a Fuchs, C a Henck, R a Fogarassy, E a

a Faculté de Médecine (France)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHEMICAL VAPOR DEPOSITION; DISSOCIATION; ELECTRIC DISCHARGES; MORPHOLOGY; PHOTOCHEMICAL REACTIONS; RAMAN SPECTROSCOPY; SEMICONDUCTING SILICON; SILANES; THIN FILMS; ULTRAVIOLET RADIATION; VACUUM APPLICATIONS;

ELASTIC RECOIL DETECTION ANALYSIS (ERDA);

SEMICONDUCTING FILMS;

EID: 0032137460 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390050751 Document Type: Article

Times cited : (1)

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