Spectroscopic study of the vacuum ultraviolet windowless photodissociation of silicon hydrides for silicon-based film deposition

Journal of Applied Physics

Volumn 79, Issue 5, 1996, Pages 2259-2269

  Henck, R ^a   Fuchs, C ^a   Fogarassy, E ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ATOMS; CALCULATIONS; CHEMICAL VAPOR DEPOSITION; DISSOCIATION; FILM GROWTH; GASES; LOW TEMPERATURE PHENOMENA; SILANES; THIN FILMS; ULTRAVIOLET RADIATION; VACUUM;

ELASTIC RECOIL DETECTION ANALYSIS; FILM THICKNESS; HYDROGENATED AMORPHOUS SILICON; PHOTOCHEMICAL VAPOR DEPOSITION REACTORS; PHOTODISSOCIATION;

EMISSION SPECTROSCOPY;

EID: 0030107850     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.361150     Document Type: Article

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