Impact of iron contamination and roughness generated in ammonia hydrogen peroxide mixtures (SC1) on 5 nm gate oxides

Journal of the Electrochemical Society

Volumn 145, Issue 7, 1998, Pages 2589-2594

  De Gendt, S ^a   Knotter, D M ^b   Kenis, K ^a   Mertens, P W ^a,c   Heyns, M M ^a  

^a IMEC   (Belgium)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

^c ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; CHEMICAL CLEANING; CONTAMINATION; DECOMPOSITION; ETCHING; HYDROGEN PEROXIDE; IRON; OXIDES; POINT DEFECTS; SURFACE ROUGHNESS;

GATE OXIDES; IMMERSION;

SILICON WAFERS;

EID: 0032123884     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838686     Document Type: Article

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