Atomic force microscopy study of self-affine fractal roughness of porous silicon surfaces

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 7, 1998, Pages 3951-3953

  Happo, Naohisa ^a   Fujiwara, Makoto ^a   Iwamatsu, Masao ^a   Horii, Kenju ^a  

^a HIROSHIMA CITY UNIVERSITY   (Japan)

Author keywords

AFM; Fractal; Porous silicon; Roughness; Self affine

Indexed keywords

ANODIC OXIDATION; ATOMIC FORCE MICROSCOPY; ELECTROCHEMISTRY; SURFACE ROUGHNESS;

SELF-AFFINE;

POROUS SILICON;

EID: 0032118360     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.3951     Document Type: Article

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