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Volumn 54, Issue 1-3, 1998, Pages 342-345

High-energy co-implantation of Ti and O ions into sapphire

(9) Nakao, Setsuo a Ikeyama, Masami a Tazawa, Masato a Jin, Ping a Niwa, Hiroaki a Tanemura, Seita a Miyagawa, Yoshiko a Miyagawa, Soji a Saitoh, Kazuo a

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

Author keywords

Cobalt implantation; Oxygen ion; Rutile type microcrystals; Sapphire substrate; Tandem type ion accelerator; Titanium ion

Indexed keywords

ABSORPTION SPECTROSCOPY; ANNEALING; CRYSTAL MICROSTRUCTURE; ION IMPLANTATION; IONS; LIGHT ABSORPTION; OXYGEN; RUTHERFORD BACKSCATTERING SPECTROSCOPY; TITANIUM; X RAY DIFFRACTION ANALYSIS;

HIGH ENERGY COIMPLANTATION; MICROCRYSTAL; SAPPHIRE SUBSTRATES;

SAPPHIRE;

EID: 0032116644 PISSN: 02540584 EISSN: None Source Type: Journal
DOI: 10.1016/S0254-0584(98)00055-8 Document Type: Article

Times cited : (8)

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