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Volumn 281-282, Issue 1-2, 1996, Pages 10-13
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Microstructure of germanium films crystallized by high energy ion irradiation
a a a a a a a |
Author keywords
CaF2 substrate; Ge films; Ion beam irradiation; Solid phase epitaxial growth
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Indexed keywords
CALCIUM COMPOUNDS;
EPITAXIAL GROWTH;
FILM GROWTH;
GERMANIUM;
ION BEAMS;
ION BOMBARDMENT;
LOW TEMPERATURE OPERATIONS;
MICROSTRUCTURE;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SPECTROMETRY;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY DIFFRACTION;
CALCIUM FLUORIDE;
CHANNELING TECHNIQUE;
ION BEAM IRRADIATION;
SOLID PHASE EPITAXIAL GROWTH;
AMORPHOUS FILMS;
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EID: 4243841994
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/0040-6090(96)08562-8 Document Type: Article |
Times cited : (11)
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References (13)
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