Fabrication of submicrometric magnetic structures by electron-beam lithography

Journal of Applied Physics

Volumn 84, Issue 1, 1998, Pages 411-415

  Martin J I ^a,b   Jaccard, Y ^a   Hoffmann, A ^a   Nogues J ^a,c   George, J M ^a,d   Vicent, J L ^a,b   Schuller, Ivan K ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b UNIVERSIDAD COMPLUTENSE DE MADRID   (Spain)

^c UNIVERSITAT AUTÒNOMA DE BARCELONA   (Spain)

^d THALES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

LATTICE CONSTANTS; MAGNETIC HYSTERESIS; MAGNETIC MATERIALS; MAGNETIC RECORDING; MAGNETIZATION; MAGNETORESISTANCE; METALLIC FILMS; SCANNING ELECTRON MICROSCOPY; STRUCTURE (COMPOSITION); SUPERCONDUCTING FILMS; SUPERCONDUCTIVITY; TRANSPORT PROPERTIES;

MAGNETIC DOT; MAGNETIC STRUCTURE; MAGNETIZATION REVERSAL; NIOBIUM FILM; PINNING EFFECT; SUBMICROMETRIC STRUCTURE;

ELECTRON BEAM LITHOGRAPHY;

EID: 0032109128     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368042     Document Type: Article

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