Gate stack formation using a fully integrated single wafer cluster tool

Materials Research Society Symposium - Proceedings

Volumn 470, Issue , 1997, Pages 221-227

  Frystak, David C ^a   Kuehne, John ^a   Wise, Rick ^a   Fowler, Burt ^a   Grothe, Phil ^a   Barnett, Joel ^a   Miner, Gary ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL DEFECTS; ELECTRIC BREAKDOWN OF SOLIDS; GATES (TRANSISTOR); THERMOOXIDATION;

GATE STACK FORMATION; RAPID THERMAL OXIDATION; SINGLE WAFER CLUSTER TOOL;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031334518     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-470-221     Document Type: Conference Paper

References (0)