Preparation of ceria thin films and microtubes by vapor-phase deposition using NiO as oxygen source

Thin Solid Films

Volumn 323, Issue 1-2, 1998, Pages 18-22

  Inaba, Minoru ^a   Mineshige, Atsushi ^a   Nakanishi, Shinji ^a   Nishimura, Isao ^b   Tasaka, Akimasa ^b   Kikuchi, Kenji ^c   Ogumi, Zempachi ^a  

^a KYOTO UNIVERSITY   (Japan)

^b DOSHISHA UNIVERSITY   (Japan)

^c UNIVERSITY OF SHIGA PREFECTURE   (Japan)

Author keywords

Ceria; Electrochemical vapor deposition; Microtube; Nickel oxide; Thin film

Indexed keywords

ELECTRODEPOSITION; FILM PREPARATION; NICKEL COMPOUNDS; REACTION KINETICS; SUBSTRATES; THIN FILMS;

CERIA; ELECTROCHEMICAL VAPOR DEPOSITION (EVD); VAPOR PHASE DEPOSITION;

CERIUM COMPOUNDS;

EID: 0032096992     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00927-9     Document Type: Article

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