Optical absorption edge in structure-inhomogeneous a-Si:H-based alloys

Journal of Non-Crystalline Solids

Volumn 226, Issue 3, 1998, Pages 217-224

  Budaguan, Boris G ^a   Aivazov, Arcady A ^a   Stryahilev, Denis A ^a   Sokolov, Evgeni M ^a   Metselaar, J W ^b  

^a NATIONAL RESEARCH UNIVERSITY OF ELECTRONIC TECHNOLOGY   (Russian Federation)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; INFRARED SPECTROSCOPY; LIGHT ABSORPTION; MICROSTRUCTURE; PLASMA APPLICATIONS; SEMICONDUCTOR QUANTUM WELLS; SILANES; SILICON NITRIDE;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

AMORPHOUS ALLOYS;

EID: 0032096019     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(98)00452-9     Document Type: Article

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