Depth inhomogeneity of deposited thin films: Application to semi-insulating polycrystalline silicon films

Thin Solid Films

Volumn 323, Issue 1-2, 1998, Pages 53-58

  Kucirkova A ^a   Navratil K ^a   Zemek, J ^b  

^a MASARYK UNIVERSITY   (Czech Republic)

^b INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

Auger electron spectroscopy (AES); Depth profiling; Optical properties; Reflection spectroscopy

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; OPTICAL VARIABLES MEASUREMENT; POLYCRYSTALLINE MATERIALS; REFRACTIVE INDEX; SEMICONDUCTING SILICON; THIN FILMS;

DEPTH PROFILING; REFLECTION SPECTROSCOPY;

SEMICONDUCTING FILMS;

EID: 0032095360     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)01025-0     Document Type: Article

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