Direct observation of local strain field for ULSI devices

Microelectronics Reliability

Volumn 38, Issue 6-8, 1998, Pages 913-917

  Hashikawa, N ^a   Fukumoto, K ^a   Kuroi, T ^a   Ikeno, M ^a   Mashiko, Y ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON DIFFRACTION; ULSI CIRCUITS;

SHALLOW TRENCH ISOLATION (STI);

INTEGRATED CIRCUIT TESTING;

EID: 0032084054     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(98)00135-8     Document Type: Article

References (6)

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3. Steeds J and Mansfield J. Convergent beam Electron Diffraction of Alloy Phases, Adam Hilger, Ltd., Bristol, UK(1984).
4. Maier H J, Keller R R, Renner H, Mughrabi H and Preston A. Philos. Mag. 23 pp74-82 (1996).
5. Humphreys C J. Rep. Prog. Phys 42 pp1826-1887(1979).
6. Wortman J J and Evans RA. JAP 36 pp153-156(1965).