Investigations of the electrical and structural characteristics of 50 MeV 7Li implanted SI-InP

Physica Status Solidi (A) Applied Research

Volumn 167, Issue 1, 1998, Pages 157-163

  Dharmarasu, N ^a   Arulkumaran, S ^a   Sumathi, R R ^a   Jayavel, P ^a   Kumar, J ^a   Asokan, K ^b   Kanjilal, D ^b  

^a ANNA UNIVERSITY   (India)

^b INTER UNIVERSITY ACCELERATOR CENTRE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTRIC CONDUCTIVITY MEASUREMENT; HALL EFFECT; ION IMPLANTATION; LITHIUM; MAGNETIC FIELD MEASUREMENT; SCANNING ELECTRON MICROSCOPY;

VAN DER PAUW TECHNIQUE;

SEMICONDUCTING INDIUM PHOSPHIDE;

EID: 0032074231     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-396X(199805)167:1<157::AID-PSSA157>3.0.CO;2-K     Document Type: Article

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