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Surface Science

Volumn 405, Issue 1, 1998, Pages 21-26

Reconstruction dependent adsorption of C60 on GaAs(111)B

(7) Moriarty, P a Upward, M D a Ma, Y R a Dunn, A W a Beton, P H a Teehan, D b Woolf, D A c

a UNIVERSITY OF NOTTINGHAM (United Kingdom)

b DARESBURY LABORATORY (United Kingdom)

c UWCC (United Kingdom)

Author keywords

Chemisorption; Fullerenes; Physical adsorption; Silicon; Soft X ray photoelectron spectroscopy; Surface chemical reaction

Indexed keywords

CHEMISORPTION; FULLERENES; GAS ABSORPTION; PHOTOEMISSION; SILICON; STOICHIOMETRY; SURFACE PHENOMENA; SURFACE STRUCTURE;

SURFACE CHEMICAL REACTION; SURFACE RECONSTRUCTION;

SEMICONDUCTING GALLIUM ARSENIDE;

EID: 0032073314 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(97)01074-1 Document Type: Article

Times cited : (8)

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