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Volumn 21, Issue 5, 1998, Pages 71-78

Progress in in situ contamination control

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL SENSORS; CONTAMINATION; MOISTURE DETERMINATION; OPTICAL SENSORS;

EID: 0032071647     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (6)

References (11)
  • 1
    • 30944437561 scopus 로고
    • Establishing Moisture Test Methods for Process Gas Distribution Systems
    • May
    • J.J.F. McAndrew, M.D. Brandt and G. Kasper, "Establishing Moisture Test Methods for Process Gas Distribution Systems," Microcontamination, May 1991, p. 33.
    • (1991) Microcontamination , pp. 33
    • McAndrew, J.J.F.1    Brandt, M.D.2    Kasper, G.3
  • 2
    • 0028509789 scopus 로고
    • Using Simulation to Optimize Gas Distribution System Cost and Performance
    • J.J.F. McAndrew, B. Jurcik and D. Znamensky, "Using Simulation to Optimize Gas Distribution System Cost and Performance," IES Journal, Vol. 37, No. 3, 1994, p. 30.
    • (1994) IES Journal , vol.37 , Issue.3 , pp. 30
    • McAndrew, J.J.F.1    Jurcik, B.2    Znamensky, D.3
  • 3
    • 30944438801 scopus 로고
    • APIMS Technology: Sub-ppb Measurement of Contaminants in Nitrogen with APIMS Trace
    • C. Ronge, et al., "APIMS Technology: Sub-ppb Measurement of Contaminants in Nitrogen with APIMS Trace," Microcontamination Conference Proceedings, 1991, p. 153.
    • (1991) Microcontamination Conference Proceedings , pp. 153
    • Ronge, C.1
  • 5
    • 0030288366 scopus 로고    scopus 로고
    • Current Capabilities and Limitations of in Situ Particle Monitors in Silicon processing Equipment
    • K.M. Takahashi and J.E. Daughtery, "Current Capabilities and Limitations of In Situ Particle Monitors in Silicon processing Equipment," J. Vac. Science and Tech., A, Vol. 14, No. 6, 1996, p. 40.
    • (1996) J. Vac. Science and Tech., A , vol.14 , Issue.6 , pp. 40
    • Takahashi, K.M.1    Daughtery, J.E.2
  • 6
    • 0030286292 scopus 로고    scopus 로고
    • Particle Behavior in Vacuum Systems
    • P.D. Kinney, et al, "Particle Behavior in Vacuum Systems," IES Journal, Vol. 39, No. 6, p. 40.
    • IES Journal , vol.39 , Issue.6 , pp. 40
    • Kinney, P.D.1
  • 7
    • 30944451086 scopus 로고    scopus 로고
    • Oct.
    • C. DiCouto, Micro, Oct. 1996, p. 103.
    • (1996) Micro , pp. 103
    • DiCouto, C.1
  • 8
    • 0030313899 scopus 로고    scopus 로고
    • Process Monitoring of Tungsten Chemical Vapor Deposition and Etchback with Residual Gas Analysis
    • B. Bradshaw, et al., "Process Monitoring of Tungsten Chemical Vapor Deposition and Etchback with Residual Gas Analysis," IES Conf. Proceedings, 1996, p. 382.
    • (1996) IES Conf. Proceedings , pp. 382
    • Bradshaw, B.1
  • 9
    • 0030313311 scopus 로고    scopus 로고
    • Detection of 1 ppm Contamination Levels Using the Micropole RGA
    • S. Boumsellek and R.J. Ferran, "Detection of 1 ppm Contamination Levels Using the Micropole RGA," IES Conf. Proceedings, 1996, p. 1.
    • (1996) IES Conf. Proceedings , pp. 1
    • Boumsellek, S.1    Ferran, R.J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.