Adsorption and temperature-dependent decomposition of SO2 on Ni(110): An XPS and XAFS study

Surface Science

Volumn 405, Issue 2-3, 1998, Pages 215-227

  Wilde, L ^a,c   Polcik, M ^a   Haase, J ^a   Brena, B ^b   Cocco, D ^b   Comelli, G ^b   Paolucci, G ^b  

^a FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

^b SINCROTRONE TRIESTE   (Italy)

^c INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

Chemisorption; Low index crystal surfaces; Nickel; Photoelectron spectroscopy (XPS); Photon absorption spectroscopy (NEXAFS SEXAFS); Sulfur dioxide; Surface structure

Indexed keywords

ADSORPTION; ATOMS; CHEMICAL BONDS; CHEMISORPTION; CRYSTALS; DECOMPOSITION; HEATING; NICKEL; SULFUR DIOXIDE; SURFACE MEASUREMENT; SURFACE STRUCTURE; X RAY PHOTOELECTRON SPECTROSCOPY;

PHOTON ABSORPTION SPECTROSCOPY; X RAY ABSORPTION FINE STRUCTURE MEASUREMENT;

SURFACE PHENOMENA;

EID: 0032071027     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(98)00050-8     Document Type: Article

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