Photopolymers designed for laser ablation - Photochemical ablation mechanism

Applied Surface Science

Volumn 127-129, Issue , 1998, Pages 117-121

  Lippert, Thomas ^a   Dickinson, J T ^b   Langford, S C ^b   Furutani, H ^c   Fukumura, H ^c   Masuhara, H ^c   Kunz, T ^d   Wokaun, A ^d  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

^b WASHINGTON STATE UNIVERSITY   (United States)

^c OSAKA UNIVERSITY   (Japan)

^d PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

Excimer laser; Laser ablation; Mechanism; Photopolymer; Triazenopolymer

Indexed keywords

ADSORPTION; DECOMPOSITION; EXCIMER LASERS; INTERFEROMETRY; LIGHT REFLECTION; LIGHT TRANSMISSION; MASS SPECTROMETRY; POLYMERS; PULSED LASER APPLICATIONS;

PHOTOPOLYMERS; TIME OF FLIGHT MASS SPECTROSCOPY (TOF MS);

LASER ABLATION;

EID: 0032070597     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(97)00620-X     Document Type: Article

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