Photopolymers designed for high resolution laser ablation at a specific irradiation wavelength

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2992, Issue , 1997, Pages 135-143

  Lippert, Thomas ^a   Bennett, L S ^a   Kunz, T ^b   Hahn, C ^b   Wokaun, A ^b   Furutani, H ^c   Fukumura, H ^c   Masuhara, H ^c   Nakamura, T ^d   Yabe, A ^d  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

^b PAUL SCHERRER INSTITUTE   (Switzerland)

^c OSAKA UNIVERSITY   (Japan)

^d NATL INST OF MAT AND CHEM RES   (Japan)

Author keywords

Excimer laser; Laser ablation; Mechanism; Photopolymer; Triazenopolymer

Indexed keywords

ABLATION; CHEMICAL MODIFICATION; CHLORINE COMPOUNDS; CHROMOPHORES; DRY ETCHING; EXCIMER LASERS; IRRADIATION; MECHANISMS; PHOTOPOLYMERS;

ABSORPTION PROPERTY; ABSORPTION WAVELENGTHS; DYNAMIC ABSORPTION; ETCHING MECHANISM; IRRADIATION WAVELENGTH; LASER-INDUCED MICROEXPLOSION; PHOTOCHEMICAL DECOMPOSITIONS; TRIAZENOPOLYMER;

LASER ABLATION;

EID: 0000473437     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.270092     Document Type: Conference Paper

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