Field emission from filtered arc deposited amorphous diamond

Materials Letters

Volumn 35, Issue 3-4, 1998, Pages 157-160

  Zhao, J P ^a,b   Chen, Z Y ^a   Wang, X ^a   Yang, S Q ^a   Shi, T S ^a   Liu, X H ^a   Jang, J ^c   Park, K C ^c  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b KYUSHU UNIVERSITY   (Japan)

^c Kyung Hee University   (South Korea)

Author keywords

Amorphous diamond; Field emission; Filtered arc deposition; Planar diode structure

Indexed keywords

AMORPHOUS FILMS; DEPOSITION; ELECTRIC FIELD EFFECTS; ELECTRON EMISSION; FILM PREPARATION;

FILTERED ARC DEPOSITION (FAD); PLANAR DIODE STRUCTURE;

DIAMOND FILMS;

EID: 0032070427     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(97)00242-5     Document Type: Article

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