Preparation and characterization of MgF2 thin film by a trifluoroacetic acid method

Thin Solid Films

Volumn 304, Issue 1-2, 1997, Pages 252-255

  Fujihara, Shinobu ^a   Tada, Munehiro ^a   Kimura, Toshio ^a  

^a KEIO UNIVERSITY   (Japan)

Author keywords

Mgf2; Microstructure; Thin film; Transmittance; Trifluoroacetic acid

Indexed keywords

FLUORINE COMPOUNDS; GELS; GLASS; HEAT TREATMENT; LIGHT TRANSMISSION; MAGNESIUM COMPOUNDS; PARTICLE SIZE ANALYSIS; SCANNING ELECTRON MICROSCOPY; SILICA; SUBSTRATES; THERMOANALYSIS; THIN FILMS;

FIELD EMISSION SCANNING ELECTRON MICROSCOPY (FESEM); MAGNESIUM FLUORIDE; TRIFLUOROACETIC ACID;

OPTICAL FILMS;

EID: 0031193035     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00156-9     Document Type: Article

References (7)

1. H.K. Pulker, Appl. Opt. 18 (1979) 1969.
2. T. Furubayashi, J. Magn. Magn. Mater. 140-144 (1995) 393.
3. R. Thielsch, H. Bottcher, Chem. Phys. Lett. 189 (1992) 226.
4. S. Tokito, Y. Taga, Appl. Phys. Lett. 66 (1995) 673.
5. J.J. Weimer, J. Kim, M. Zukic, D.G. Torr, J. Vac. Sci. Technol. A13 (1995) 1008.
6. P.H. Joosten, P. Heller, H.J.P. Nabben, H.A.M. van Hal, T.J.A. Popma, J. Haisma, Appl. Opt. 24 (1985) 2674.
7. I.M. Thomas, Appl. Opt. 27 (1988) 3356.