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Applied Surface Science

Volumn 96-98, Issue , 1996, Pages 242-250

Dynamics of silicon plume generated by laser ablation and its chemical reaction

(2) Makimura, T a Murakami, K a

a UNIVERSITY OF TSUKUBA (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL REACTIONS; DYNAMICS; HELIUM; IONS; LASER ABLATION; LIGHT EMISSION; NEODYMIUM LASERS; OXYGEN; Q SWITCHING; THIN FILMS; X RAY SPECTROSCOPY;

HELIUM BUFFER GAS; NEODYMIUM YTTRIUM ALUMINUM GARNET LASER; SILICON LASER PLUME; SOFT X RAY ABSORPTION SPECTROSCOPY; SPACE RESOLVED EMISSION SPECTRA;

SILICON;

EID: 0030562993 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/0169-4332(95)00428-9 Document Type: Article

Times cited : (16)

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