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Applied Surface Science

Volumn 127-129, Issue , 1998, Pages 805-809

XPS study of XeCl excimer-laser-etched InP

(5) Wrobel, Jerzy M a Moffitt, Christopher E a Wieliczka, David M a Dubowski, Jan J b Fraser, Jeffrey W b

a UNIVERSITY OF MISSOURI KANSAS CITY (United States)

b NATIONAL RESEARCH COUNCIL CANADA (Canada)

Author keywords

Cl etching; InP; Laser; Scanning electron microscopy (SEM); X ray photoelectron spectroscopy (XPS)

Indexed keywords

CHLORINE; ETCHING; EXCIMER LASERS; HELIUM; LASER ABLATION; MORPHOLOGY; PHOTOCHEMICAL REACTIONS; SCANNING ELECTRON MICROSCOPY; SURFACE STRUCTURE; X RAY PHOTOELECTRON SPECTROSCOPY;

PHOTOCHEMICAL ETCHING;

SEMICONDUCTING INDIUM PHOSPHIDE;

EID: 0032069320 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(97)00746-0 Document Type: Article

Times cited : (9)

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