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Volumn 420, Issue , 1996, Pages 381-386
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Amorphous silicon-carbon alloys deposited by electron-cyclotron resonance PECVD
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS SILICON;
BAND STRUCTURE;
CARBON;
CHEMICAL VAPOR DEPOSITION;
ELECTRON CYCLOTRON RESONANCE;
GLOW DISCHARGES;
HYDROGEN;
HYDROGENATION;
MICROWAVES;
PHOTOCONDUCTIVITY;
PLASMA APPLICATIONS;
TEMPERATURE;
AMORPHOUS SILICON CARBON ALLOYS;
BANDGAP;
EXCITATION GAS;
HYDROGEN DILUTION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
RESONANCE CHAMBER;
AMORPHOUS ALLOYS;
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EID: 0030407698
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-420-381 Document Type: Conference Paper |
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Times cited : (2)
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References (8)
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