Conductive microcrystalline-Si films produced by laser processing

Journal of Non-Crystalline Solids

Volumn 227-230, Issue PART 2, 1998, Pages 916-920

  Dahlheimer, B ^a   Karrer, U ^a   Nebel, C E ^a   Stutzmann, M ^a  

^a WALTER SCHOTTKY INSTITUT   (Germany)

Author keywords

Crystallization; Crystallized layers; Electronic properties; Interference patterns; Interfering laser pulses

Indexed keywords

ATOMIC FORCE MICROSCOPY; CONDUCTIVE FILMS; CRYSTALLINE MATERIALS; CRYSTALLIZATION; NEODYMIUM LASERS; NUCLEATION; PULSED LASER APPLICATIONS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; SEMICONDUCTOR GROWTH; X RAY DIFFRACTION ANALYSIS;

PULSED LASER INTERFERENCE CRYSTALLIZATION;

SEMICONDUCTING FILMS;

EID: 0032068612     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(98)00214-2     Document Type: Article

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