A 10.5-in.-diagonal SXGA active-matrix display

IBM Journal of Research and Development

Volumn 42, Issue 3-4, 1998, Pages 427-441

  Colgan, E G ^{a,b,c,d,e,f,g,h}   Alt, P M ^a,e,i,j   Wisnieff, R L ^{a,e,h,k,l,m,n}   Fryer, P M ^a,e,o,p   Galligan, E A ^a,e,q   Graham, W S ^a,e   Greier, P F ^a,e,r,s,t   Horton, R R ⁿ   Ifill, H ⁿ   Jenkins, L C ⁿ   John, R A ⁿ   Kaufman, R I ⁿ   Kuo, Y ⁿ   Lanzetta, A P ⁿ   Latzko, K F ⁿ   Libsch, F R ⁿ   Lien, S C A ⁿ   Millman, S E ⁿ   Nywening, R W ⁿ   Polastre, R J ⁿ   Powell, C G ⁿ   Rand, R A ⁿ   Ritsko, J J ⁿ   Rothwell, M B ⁿ   Staples, J L ⁿ   Warren, K W ⁿ   Wilson, J S ⁿ   Wright, S L ⁿ   more..

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b Thin Film Transistor Proc Dept   (United States)

^c Chugai Pharma USA   (United States)

^d Semiconduct R and D Center   (United States)

^e IBM   (United States)

^f CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^g Department of Obstetrics Gynecology   (United States)

^h IEEE

ⁱ Society for Information Display

^j Inst Elec Electronics Engineers

^k TUFTS UNIVERSITY   (United States)

^l YALE UNIVERSITY   (United States)

^m IBM's Adv Display Technol Lab

ⁿ Tufts University ^*

^o IONA COLLEGE   (United States)

^p Polytechnic University

^q SUNY Dutchess Community College   (United States)

^r MERCY COLLEGE   (United States)

^s POLYTECHNIC UNIVERSITY   (United States)

^t SID Symposium ^*

more..

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM ALLOYS; COLOR IMAGE PROCESSING; COPPER ALLOYS; ELECTRIC CONDUCTIVITY OF SOLIDS; GATES (TRANSISTOR); IMAGE ANALYSIS; IMAGE QUALITY; LIQUID CRYSTAL DISPLAYS; MASKS; METALLIZING; THIN FILM TRANSISTORS;

FLEXIBLE DRIVE ELECTRONIC SYSTEMS; LOW RESISTIVITY GATE METALLIZATION;

COMPUTER MONITORS;

EID: 0032068579     PISSN: 00188646     EISSN: None     Source Type: Journal    
DOI: 10.1147/rd.423.0427     Document Type: Article

References (16)

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